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  1. C0700 総合理学研究所
  2. 03 紀要論文
  3. 01 Science Journal of Kanagawa University
  4. 0300 30巻

Formation of SiC Nanocrystals Aligned at the SiO2/Si Interface Aiming at Sample Preparation for Scanning Tunneling Luminescence Spectroscopy

http://hdl.handle.net/10487/00015990
http://hdl.handle.net/10487/00015990
2891274c-f564-431a-8b55-d9a6f4c411d6
名前 / ファイル ライセンス アクション
01 01 Formation of SiC Nanocrystals Aligned at the SiO2/Si Interface Aiming at Sample Preparation for Scanning Tunneling Luminescence Spectroscopy (2.3 MB)
Item type その他 / Others(1)
公開日 2020-03-13
タイトル
タイトル Formation of SiC Nanocrystals Aligned at the SiO2/Si Interface Aiming at Sample Preparation for Scanning Tunneling Luminescence Spectroscopy
言語
言語 eng
キーワード
主題 nanocrystal, scanning tunneling microscope, electroluminescence, silicon carbide, resonant elastic Rutherford backscattering, nanocrystal, scanning tunneling microscope, electroluminescence, silicon carbide, resonant elastic Rutherford backscattering
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_1843
資源タイプ other
著者 Hoshino, Yasushi

× Hoshino, Yasushi

Hoshino, Yasushi

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Soga, Yu

× Soga, Yu

Soga, Yu

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Nakata, Jyoji

× Nakata, Jyoji

Nakata, Jyoji

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抄録
内容記述タイプ Abstract
内容記述 We investigated the synthesis of SiC nanocrystals (NCs) of several nanometers on a crystalline Si(001) surface, aiming at sample preparation for scanning tunneling luminescence using a novel conductive transparency probe. Two methods for C implantation and CO diffusion to SiO2/Si(001) samples were adopred for the formation of nanocrystalline SiC aligned on the Si(001) surface. The characterization of NCs: crystalline structure, shape, size and areal density, were analyzed by reflection high-energy electron diffraction, scanning probe microscopy and Rutherford backscattering spectroscopy. The C implantation method could not form sufficient NCs on the surface since the diffusion of C to the interface was not adequarely promoted by thermal annealing. On the other hand, almost an ideal structure of SiC NCs of ~10 nm on the Si(001) surface was realized by CO annealing under 0.2 bar at 1100 ℃ for 0.5 h. The size of NCs primarily depends on the annealing time: the annealing conditions should be optimized for further decrement of the NC size.
内容記述
内容記述タイプ Other
内容記述 Full-Length Paper
内容記述
内容記述タイプ Other
内容記述 By a grant from Research Institute for Integrated Science, Kanagawa University
書誌情報 Science Journal of Kanagawa University

巻 30, p. 1-7, 発行日 2019-06-30
ISSN
収録物識別子タイプ ISSN
収録物識別子 1880-0483
書誌レコードID
収録物識別子タイプ NCID
収録物識別子 AA12068302
著者版フラグ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
出版者
出版者 神奈川大学総合理学研究所
資源タイプ
内容記述タイプ Other
内容記述 Departmental Bulletin Paper
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