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中電流型イオン注入装置の導入
http://hdl.handle.net/10487/1458
http://hdl.handle.net/10487/1458191f0f7c-3049-4040-930d-4b0827f3edec
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
SJKU Vol 18 95-102.pdf (1.2 MB)
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| Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2009-02-23 | |||||
| タイトル | ||||||
| タイトル | 中電流型イオン注入装置の導入 | |||||
| 言語 | ||||||
| 言語 | jpn | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | ion implantation | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | semiconductor | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | doping | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | material modification | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | departmental bulletin paper | |||||
| 著者 |
中田, 穣治
× 中田, 穣治× 斎藤, 保直× 川崎, 克則× 服部, 俊幸× Nakata, Jyoji× Saito, Yasunao× Kawasaki, Katsunori× Hattori, Toshiyuki |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | A medium-current-type ion implanter was introduced into Kanagawa University. This machine can be used for various purposes, for example, characteristic changes of various materials such as metals, semiconductors, or insulators. Doping various impurities to many kinds of semiconductors is one of the principal roles of semiconductor industries, to acquire controlled electrical conductivity. These features can be accomplished by irradiating various ion species at various energies for various doses. This implanter can implant ion species from hydrogen to atoms with a mass number around gold. The accelerated ion energy ranges from 5 keV to 200keV. The most peculiar feature of this machine is the structure of the target holder, that is, endstation construction. Targets can be kept during ion implantation at temperatures from -200℃ using a liquid nitrogen cooling system to 1000℃ by heaters. The specification of these features cannot be achieved by any other ion implanter in the world. We sincerely hope that this machine will be widely used in Kanagawa University. | |||||
| 書誌情報 |
Science Journal of Kanagawa University 巻 18, p. 95-102, 発行日 2007-05-25 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 1880-0483 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA12068302 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
| その他の言語のタイトル | ||||||
| その他のタイトル | Establishment of Medium Current Ion Implanter at Kanagawa University | |||||
| 出版者 | ||||||
| 出版者 | 神奈川大学 | |||||
